Syllabus for Thin Film Technology I

Tunnfilmsteknik I

A revised version of the syllabus is available.


  • 5 credits
  • Course code: 1TE016
  • Education cycle: Second cycle
  • Main field(s) of study and in-depth level: Technology A1F, Physics A1F, Materials Engineering A1F, Chemistry A1F
  • Grading system: Fail (U), Pass (3), Pass with credit (4), Pass with distinction (5)
  • Established: 2010-03-16
  • Established by: The Faculty Board of Science and Technology
  • Revised: 2016-04-18
  • Revised by: The Faculty Board of Science and Technology
  • Applies from: week 27, 2016
  • Entry requirements: 130 credits within Science and Technology. Materials Analysis should have been attended.
  • Responsible department: Department of Materials Science and Engineering

Learning outcomes

After a successfully completed course the students will be able to:

  • discuss the differences and similarities between different vacuum based deposition techniques,
  • evaluate and use models for nucleating and growth of thin films,
  • asses the relation between deposition technique, film structure, and film properties,
  • discuss typical thin film applications,
  • motivate selection of deposition techniques for various applications.


Deposition by various PVD techniques such as evaporation, sputtering, ion-plating as well as chemical coating methods (CVD and ALD). Plasma technologies for thin films. Fundamental physical and chemical processes. Effect of the substrate on the film growth and techniques for surface modification. Models for nucleation and film growth. Morphology and texture and their impact on material properties. Applications of thin film materials and deposition technologies.


Lectures, seminars and demonstrations.


Written examination (4 credits). Laboratory demonstrations (1 credit).

Reading list

Reading list

Applies from: week 27, 2016

  • Smith, Donald L. Thin-film deposition : principles and practice

    New York: McGraw-Hill, cop. 1995

    Find in the library

  • Ohring, Milton Materials science of thin films : deposition and structure

    2. ed.: San Diego, CA: Academic Press, cop. 2002

    Find in the library